Studies and Research on the Production of TiO2 and TiN thin Film by Assisted Physical Vapor Deposition Magnetron Process

dc.contributor.author	Boiciuc, Simona
dc.contributor.author	Alexandru, Petrică
dc.date.accessioned	2018-04-30T10:55:11Z
dc.date.available	2018-04-30T10:55:11Z
dc.date.issued	2017
dc.identifier.uri	http://10.11.10.50/xmlui/handle/123456789/5096
dc.description	The Annals of "Dunarea de Jos" University of Galati : Fascicle IX Metallurgy and Materials Science No. 1 - 2017, ISSN 1453-083X	ro_RO
dc.description.abstract	The experimental research carried out in this paper aims at obtaining thin films of TiO2 and TiN and at characterizing them in terms of morphology, structure, transparency and electrical properties. The films were obtained using a PVD device of sputtering coating, consisting of a vacuum chamber with a capacity of 2 liters, a planar magnetron with ferrite magnets.	ro_RO
dc.language.iso	en	ro_RO
dc.publisher	Universitatea "Dunărea de Jos" din Galați	ro_RO
dc.subject	magnetron	ro_RO
dc.subject	electrical and optical properties	ro_RO
dc.title	Studies and Research on the Production of TiO2 and TiN thin Film by Assisted Physical Vapor Deposition Magnetron Process	ro_RO
dc.type	Article	ro_RO